Semiconductor applications require components with precise specifications and exceptional performance properties. Silicon carbide has long been recognized as an ideal material for these applications; however, the traditional production processes of silicon carbide can result in impure elements that compromise the true performance of this material.

Rohm and Haas’s bulk chemical vapor deposition (CVD) process for silicon carbide creates a solid, highly pure (>99.9995%) material. Our CVD SILICON CARBIDE™ material enables design engineers to fully leverage the properties of silicon carbide, such as its superior hardness and stiffness, low coefficient of thermal expansion, and excellent chemical and oxidation resistance.

Our state-of-the-art R&D and manufacturing facilities ensure that you receive consistent quality and support during every step of your product design and implementation process.