The Newark facility serves CMP Technologies business of the Rohm and Haas Electronic Materials Division.

Rohm and Haas Electronic Materials develops and manufactures products used for chemical mechanical polishing (CMP) and are used in the fabrication of almost every type of electronic chip made today.  CMP is the process used to create the flawless surfaces required to make faster and more powerful integrated circuits and electronic substrates semiconductors.  Our products include polishing pads, pad conditioners, slurries, reactive chemical solutions, carrier films and template assemblies.

We operate 24 hours a day, seven days a week with 750 employees in 15 buildings of the Diamond State Industrial Park. 

In addition to our manufacturing facility, we have state-of-the-art research facilities, applications labs, clean rooms, finished product warehousing, and a small scale pilot line.