top
left Dow right
Dow Eletronic Materials
Interconnect Technologies
bottom

About Dow
Featured ProductsWebsite Publications
WebinarNews releaseContact

 

Print Media Publications

Metal Finishing
January/February 2011 Edition

A Novel Electrolyte for the High Speed Electrodeposition of Bright Pure Tin at Elevated Temperatures (pdf)


Electronic Journal
January, 2011

The evolution of electroless copper plating technology for high density and reliability electronic devices - ENG (pdf)

The evolution of electroless copper plating technology for high density and reliability electronic devices - Japanese (pdf)


Microelectronic Engineering
Volume 87, Issue 12, December 2010

Interpretation of texture changes during self-annealing of electroplated copper (pdf)


TPCA IMPACT Papers
October 2010

TPCA Low Gold (pdf)

IEEE Sweller (pdf)

Copper Electroplating for HDI and Substrate Through Hole Fill (pdf)

Electroplating Apparatus and Method Considerations for High
Aspect-Ratio for IMPACT
(pdf)


PVSEC
September, 2010

A HF-Free Chemistry Alternative for Multi-Crystalline Wafer Texturing (pdf)

IPA Free Texturing of Mono-Crystalline Solar Cells (pdf)


HKMFS
July Newsletter, 2010

Optimization of Decorative Acid Copper Plating Solutions for Plating on Plastics Applications (pdf)


IEEE Conference
June, 2010

In-Line and Vertical Texturing of Mono-crystalline Solar Cells (pdf)

Interaction Between Post Wire Saw Cleaning and the Subsequent Cell Fabrication Saw Damage Etch and Texturing Process (pdf)

Inkjet Platingg Resist for Improved Cell Efficiency (pdf)


Circuit World
Q1, 2010

Inner Layer Copper Reliability of Electroless Copper Processes (pdf)


PCD&F
February 2010

EP Cu for Flexible Circuits (pdf)


HKPCA Magazine
February 2010

Environmental Legislation Affecting PWB Metallization Chemistries (pdf)


Electroplating and Pollution Control
November 2009

Cost Effective Connector Production (Traditional Chinese) (pdf)

Cost Effective Connector Production (Simplified Chinese) (pdf)


IMPACT Conference
October 2009

Electroplating Equipment Design Considerations for Copper Microvia Filling (pdf)

Effect of Electroless Palladium Immersion Gold Deposit Properties on Gold Wire Bonding (pdf)


Electronic Parts and Materials
October 2009

Desmear and Copper Plating Process for Build-up Dielectric Material (Japanese) (pdf)


PVSEC
September 2009

Development of a Plated Nickel Seed Layer for Front Side Metallization of Silicon Solar Cells (pdf)

Wafer Cleaning and its Effects on Subsequent Texturing Processes (pdf)


PCD&F

August 2009

Next Generation Via Fill (English).pdf

Surface Finishing Newsletter

August 2009

Cost Effective Connector Production (English).pdf

Circuitree

July 2009

An Overview of Wet Chemistry Processing for Manufacturing
of Silicon Solar Cells.pdf


Metal Finishing

March 2009

PdNi For Connectors PALLAMET 600-English.PDF

PdNi For Connectors PALLAMET 600-简体中文.PDF

PdNi For Connectors PALLAMET 600-繁体中文.PDF



TPCA IMPACT Papers

October 2008

Next Generation Electroplating Process for HDI Microvia Filling and Through Hole Plating.pdf

Adhesion Promotion Technology for Semi-Additive Process.pdf


PCD&F

August 2008

Advanced Copper Plating by VIL.pdf

April 2008

Troubleshooting the Innerlayer Process.pdf


JPCA Paper

June 2008

Inkjet Materials for Electronic Fabrication.pdf


 


Copyright © The Dow Chemical Company (1995-2011). All Rights Reserved.
®™* Trademark of The Dow Chemical Company ("Dow") or an affiliated company of Dow