top
left Dow right
Dow Eletronic Materials
Interconnect Technologies
bottom

About Dow
Featured ProductsWebsite Publications
Print Media PublicationsWebinarNews releaseContact

 

Print Media Publications

Circuit World
Q1, 2010

Inner Layer Copper Reliability of Electroless Copper Processes (pdf)


PCD&F
February 2010

EP Cu for Flexible Circuits (pdf)


HKPCA Magazine
February 2010

Environmental Legislation Affecting PWB Metallization Chemistries (pdf)


Electroplating and Pollution Control
November 2009

Cost Effective Connector Production (Traditional Chinese) (pdf)

Cost Effective Connector Production (Simplified Chinese) (pdf)


IMPACT Conference
October 2009

Electroplating Equipment Design Considerations for Copper Microvia Filling (pdf)

Effect of Electroless Palladium Immersion Gold Deposit Properties on Gold Wire Bonding (pdf)


Electronic Parts and Materials
October 2009

Desmear and Copper Plating Process for Build-up Dielectric Material (Japanese) (pdf)


PVSEC
September 2009

Development of a Plated Nickel Seed Layer for Front Side Metallization of Silicon Solar Cells (pdf)

Wafer Cleaning and its Effects on Subsequent Texturing Processes (pdf)


PCD&F

August 2009

Next Generation Via Fill (English).pdf

Surface Finishing Newsletter

August 2009

Cost Effective Connector Production (English).pdf

Circuitree

July 2009

An Overview of Wet Chemistry Processing for Manufacturing
of Silicon Solar Cells.pdf


Metal Finishing

March 2009

PdNi For Connectors PALLAMET 600-English.PDF

PdNi For Connectors PALLAMET 600-简体中文.PDF

PdNi For Connectors PALLAMET 600-繁体中文.PDF



TPCA IMPACT Papers

October 2008

Next Generation Electroplating Process for HDI Microvia Filling and Through Hole Plating.pdf

Adhesion Promotion Technology for Semi-Additive Process.pdf


PCD&F

August 2008

Advanced Copper Plating by VIL.pdf

April 2008

Troubleshooting the Innerlayer Process.pdf


JPCA Paper

June 2008

Inkjet Materials for Electronic Fabrication.pdf


 


Copyright © 2009 Rohm and Haas Company is a wholly owned subsidiary of The Dow Chemical Company.